Skip to main content

iRubric: Half Scale Patterns - Gathers at Neckline rubric

find rubric

edit   print   share   Copy to my rubrics   Bookmark   test run   assess...   delete   Do more...
Half Scale Patterns - Gathers at Neckline 
sewing and pattern making assignment evaluation
Rubric Code: W62845
Ready to use
Public Rubric
Subject: Vocational  
Type: Project  
Grade Levels: Undergraduate

Powered by iRubric Criteria
  Poor

1 pts

needs improvement

2 pts

good

3 pts

exellent

4 pts

Seams

Seam Allowance, Stitch Quality

Poor

Seams are puckered and/or stretched. The seams are wider than what the instructions called for.
needs improvement

Seams are wider than what the instructions called for but are not stretched or puckered.
good

Seams are a little wider than what the instructions called for or are correct width but puckered or stretched.
exellent

Seams are the correct width that the instructions called for. They are not puckered or stretched.
Seams

Stitch Length, Seam Quality

Poor

Seams are not straight or curved appropriately. Stitch length is too loose or too tight.
needs improvement

Student made an attempt to sew the seam correctly: stitching is slightly off or stitch length is too loose or too tight.
good

Student grasped the concept of sewing a correct seam: straight stitching, but stitch length is too loose or too tight.
exellent

Student independently demonstrated an excellent understanding of sewing a correct seam.
Workmanship

seam/stitch quality

Poor

More than three instances of skipped stitches or seam pull back. Did not use safetly stitch to close.
Garment not well cleaned of threads.
needs improvement

Two or less instances of skipped/broken stitche and two or less instances of seam pullback. Theads messy on inside. Incorrect closure application.
good

One or less instances of broken or skipped stitches. One or less instances of seam pullback. All threads cleaned from inside garment.
exellent

No skipped /broken stitches or seam pullback.All threads cleaned. Sewn correctly and neatly.
Pattern Making

Poor

Sloper was traced loosely, edges of pattern are rough. Pattern manipulations were incorrect.
needs improvement

Sloper was traced carefully, edges of pattern are smooth and straight. Pattern manipulations were incorrect.
good

Sloper was traced loosely, edges of pattern are rough. Pattern manipulations were done correctly.
exellent

Sloper was traced carefully, edges of pattern are smooth and straight. Pattern manipulations were done correctly.
Pattern Labeling

Poor

Pattern is not labeled other than student name.
needs improvement

Pattern labeling is missing several elements.
good

Pattern labeling is missing an element.
exellent

Pattern is labeled with student name, pattern name, pattern size, pattern piece, and seam allowance. Includes notches and grainlines.
Effort and Attentiveness

Poor

The student watched few demonstrations intently and/or worked diligently to complete few steps correctly.
needs improvement

The student watched some demonstrations intently and worked diligently to complete some steps correctly.
good

The student watched most demonstrations intently and worked diligently to complete most steps correctly.
exellent

The student watched each demonstration intently and worked diligently to complete each step correctly.



Keywords:
  • sewing, pattern making

Subjects:






Do more with this rubric:

Preview

Preview this rubric.

Edit

Modify this rubric.

Copy

Make a copy of this rubric and begin editing the copy.


Print

Show a printable version of this rubric.

Categorize

Add this rubric to multiple categories.

Bookmark

Bookmark this rubric for future reference.
Assess

Test run

Test this rubric or perform an ad-hoc assessment.

Grade

Build a gradebook to assess students.

Collaborate

Apply this rubric to any object and invite others to assess.
Share

Publish

Link, embed, and showcase your rubrics on your website.

Email

Email this rubric to a friend.

Discuss

Discuss this rubric with other members.
 

Do more with rubrics than ever imagined possible.

Only with iRubrictm.

n224